Shima Seiki, computerized flat knitting machine manufacturer this June alongside its US subsidiary Shima Seiki U.S.A. Inc., to display its latest technological contributions to the field of technical textiles at the Techtextil North America exhibition in Houston, Texas.
Shima Seiki’s latest computerized knitting machine including the SRY123LP will be on display that features loop presser beds mounted atop conventional needle beds, providing improved control over pressdown of individual loops.
This machine is said to offer unprecedented capability especially with partial knitting patterns and inlay patterns. Inlay fabric is produced by inserting yarn into existing knit fabric in a weave fashion, opening opportunities for expansion into markets for wovens. Inlay also suppresses typical stretch characteristics of knitted fabrics, and since new materials such as metallic and monofilament yarns can be used for inlay structures, new applications in industrial textiles are possible.
Known for its pioneering Whole Garment knitting technology whereby a knitted item is produced in its entirety without seams, Shima Seiki will also demonstrate its SWG061N2 compact WholeGarment knitting machine that features the company’s original SlideNeedle.
Capable of producing small knitted items from safety gloves and compression socks to more sophisticated industrial applications such as tubular shields and harnesses, SWG061N2 can knit all of these items in 3D without seams.
Also on display will be the new Yarn Unwinding Option. Normally when knitting with stiff materials such as metallic and monofilament yarns, the yarn has a tendency to kink, making it practically impossible to feed smoothly into the knitting machine. A motorized bobbin actively unwinds yarn to provide smooth and stable yarn feed with careful control over feed amount and tension.
The latest version of Shima Seiki’s SDS-ONE APEX3 3D design system will also be available for demonstrations.
Shima Seiki will be on Booth 1801 at the Techtextil North America which will be held from 2-4 June at the George R. Brown Convention Center.
Eastman introduced Naia™ Lyte, a new cellulose acetate filament yarn, at the Intertextile Shanghai Apparel Fabrics Spring/Summer 2026 exhibition.
Ecco, Spinnova have introduced the Ecco BIOM 720 shoe. This product is unique as it uses leather by-products that are…
Xefco has deployed its Ausora system, marking the first time a waterless plasma textile dyeing machine has been deployed at…
trinamiX is helping manufacturers, recyclers, sorters, and brands improve material identification through its mobile near-infrared spectroscopy technology.
The Bezos Earth Fund has announced an investment of $34 million to support the development of new materials for the…
STCH is working on a system called “fabric GPT.” This tool is trained on large amounts of data related to…